High speed atomic force microscopy (HS-AFM) is one of the widely used techniques in nanotechnology applications due to high resolution and the ability of 3D imaging. Despite its advantages and although it is known as a nondestructive technique, tip or sample damage can occur if maximum repulsive force is higher than the failure stress of the sample or tip, as a result of tip-sample interactions. Several studies in understanding the peak repulsive forces in tapping mode AFM have been carried out, but mostly in steady state situations. In transient situation when tip encounters a sudden steep upward step, the repulsive force can be much higher than that in the steady state situation and, consequently, damage could happen. Therefore, if appropriate parameters’ values are not tuned, the tip-sample stress may exceed yield stress of the tip or the sample. This paper presents the comparison of maximum transient interaction forces in time periods of net attractive and repulsive forces and the effects of important scanning parameters on maximum transient stress of compliant samples with the elastic modulus in the range of 2GPa together with lateral resolution and scanning speed diagrams, using theoretical analysis as a novelty of this paper, so that selecting cantilever stiffness in the range of 0.1-1N/m, free air amplitude 60-100nm, amplitude ratio 0.8-0.9, quality factor 50-100, tip radius 10-40 nm, and scanning speed 0.1-0.3mm/s relative to required lateral resolution indeed leads to safe high speed microscopy.