Volume 14, Issue 12 (3-2015)                   Modares Mechanical Engineering 2015, 14(12): 113-121 | Back to browse issues page

XML Persian Abstract Print


Download citation:
BibTeX | RIS | EndNote | Medlars | ProCite | Reference Manager | RefWorks
Send citation to:

Ghoreishi M, tahmasbi V. Optimization of material removal rate in dry electro-discharge machining process 2. Modares Mechanical Engineering 2015; 14 (12) :113-121
URL: http://mme.modares.ac.ir/article-15-3903-en.html
1- Department, K.N. Toosi University of Technology
Abstract:   (5439 Views)
In this paper, dry electro-discharge machining (Dry EDM), one of the newest machining processes which differs mainly from conventional EDM in using gaseous dielectric along with tool electrode rotation, has been studied. Gap voltage, discharge current, pulse-on-time, pulse-off time, dielectric gas pressure, and electrode rotational speed have been considered as effective input parameters. Response surface methodology (RSM) has been used to optimize the machining performance with respect to material removal rate (MRR). Base on the results and analysis of running experiments, it can be concluded that MRR increases by increasing gap voltage, discharge current, the ratio of pulse-on time over pulse-off time, input gas pressure, and electrode rotational speed. There also exists an optimum amount of pulse-on time determined according to the machining circumstances. Also the material removal rate in dry EDM has been improved compared with that in conventional EDM in identical conditions. Keywords: Dry electro-discharge machining (Dry EDM), Gaseous dielectric, Response surface methodology (RSM) Keywords: Dry electro-discharge machining (Dry EDM), Gaseous dielectric, Response surface methodology (RSM) Keywords: Dry electro-discharge machining (Dry EDM), Gaseous dielectric, Response surface methodology (RSM)
Full-Text [PDF 396 kb]   (6160 Downloads)    

Received: 2013/12/7 | Accepted: 2014/10/3 | Published: 2014/10/4

Add your comments about this article : Your username or Email:
CAPTCHA

Rights and permissions
Creative Commons License This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.